Advanced Lithography 2021

2019/6/24


DateFeb. 23-24, 2021

Frequency:Annual

Place:San Jose Convention Center, San Jose, California, United States

Organizer: SPIE

 

Description of the event 

The SPIE Advanced Lithography Symposium has been the showcase of the latest advances in lithography and patterning technology for over four decades. The 2020 symposium will cover the full spectrum of the advances and challenges in state-of-the art lithography technology through several topical conferences. Advances in areas of nano- and micro-patterning for semiconductor IC device application will be presented in sessions devoted to optical lithography, extreme-UV (EUV) lithography, metrology/inspection, patterning materials, etch/deposition technology, and process/technology optimization. As novel patterning and non-IC lithography technologies have become more widely explored, related topics in these areas are also addressed. This year’s symposium is structured into the following seven conferences, each organized by current practitioners of the art working together with organizing committees of experts in these fields.

This year joint sessions between the conferences will be aligned with several predefined "Topical Sessions" (for example: Machine Learning, stochastic effects, 3D device patterning,..) this will offer attendees the opportunity to cover important topics common across these interest areas and minimize same topic presentation overlap. Additionally, the Novel Patterning conference will expand to now include MEMS, NEMS and MEOMS and will include an invited session from industry leaders in this field.

 

2020 SPIE Advanced Lithography Conferences

-Extreme Ultraviolet Lithography (EUV)

-Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS

-Metrology, Inspection, and Process Control for Microlithography

-Advances in Patterning Materials and Processes

-Optical Microlithography

-Design-Process-Technology Co-optimization for Manufacturability

-Advanced Etch Technology for Nanopatterning

 

Featured technologies 

· Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET

· Metrology, inspection, OPC, and process control

· Design and manufacturing software

· Materials and chemicals

· Imaging equipment

· Lasers

· Resist materials and processing

· Nano-imprint

· IC and chip fabrication

· Nanoscale imaging

· Etch Technology for nanopatterning

Why exhibit? 

Exhibit at SPIE Advanced Lithography, 23-27 February 2020, the largest gathering of lithography experts in the world. For more than 40 years, SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications.

· Reach 2,100 lithography experts

· Two exhibition days that offer opportunities for face-to-face interaction with potential customers

· 50 exhibiting companies in 2019

Who is at SPIE Advanced Lithography 

· Application and product developers

· Process engineers

· Basic and applied researchers

· Lithography technicians

· Failure analysis/materials characterization engineers

· Mico/nanoelectronic engineers

· Chip designers

· Mask manufacturers

· Resist chemists

Featured technologies at the exhibition 

· Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET

· Metrology, inspection, OPC, and process control

· Design and manufacturing software

· Materials and chemicals

· Imaging equipment

· Lasers

· Resist materials and processing

· Nano-imprint

· IC and chip fabrication

· Nanoscale imaging

· Etch Technology for nanopatterning

Why companies return year after year 

· 82% rate the quality of attendees as "good" or "excellent"

· 80% of those surveyed would be "very willing" to recommend SPIE Advanced Lithography to an associate.